Crystal structure of Co/Cu multilayers prepared by pulse potential electrodeposition with precisely controlled ultrathin layer thickness

Co/Cu multilayers were electrodeposited in a single electrolyte using the pulse potential method and the layer thickness was precisely controlled in accordance with Faraday's law. X-ray diffraction revealed that multilayers with layer thicknesses in the range of 25–100 nm consisted of fcc-Co an...

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Published inAIP advances Vol. 3; no. 2; p. 022119
Main Authors Takane, Naoto, Narita, Hiroshi, Kurogouchi, Yasuko, Arai, Susumu
Format Journal Article
LanguageEnglish
Published AIP Publishing LLC 01.02.2013
Subjects
Copper
Crystal structure
Diffraction
Electrolytes
Multilayers
Phases
Single crystals
Solvents
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Summary:Co/Cu multilayers were electrodeposited in a single electrolyte using the pulse potential method and the layer thickness was precisely controlled in accordance with Faraday's law. X-ray diffraction revealed that multilayers with layer thicknesses in the range of 25–100 nm consisted of fcc-Co and fcc-Cu phases. For layers thinner than 10 nm, the fcc-Co and fcc-Cu phases merged to form a single crystal phase. When the layers were <1 nm, one diffraction peak of the single crystal phase became proportionally higher as the layer became thinner. The surface structure of multilayers also varied with the layer thickness.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:2158-3226
2158-3226
DOI:10.1063/1.4793083