Selective metal pattern formation and its EMI shielding efficiency

• Published in: Applied surface science Vol. 252; no. 8; pp. 2665 - 2672
• Main Authors: Lee, Ho-Chul, Kim, Jin-Young, Noh, Chang-Ho, Song, Ki Yong, Cho, Sung-Heon
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 15.02.2006; Elsevier Science
• Subjects: Amorphous TiO 2; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; EMI; Exact sciences and technology; Hole-scavenger; Life-time; Mesh pattern; Photoelectron; Physics; Selective deposition; Shielding; Amorphous TiO 2; Photoelectron; EMI; Hole-scavenger; Shielding; Selective deposition; Life-time; Mesh pattern; Titanium oxides; Photoelectron: Mesh pattern; Patterning; Hole-scavenger: Life-time; Inorganic compounds; Transition element compounds; Amorphous TiO2; Amorphous state
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2005.03.206

A novel method for selective metal pattern formation by using an enhanced life-time of photoexcited electron-hole pairs in bilayer thin film of amorphous titanium dioxide and hole-scavenger-containing poly(vinyl alcohol) was proposed. By UV-irradiation through photomask on the bilayer film, the photodefined image of photoelectrons could be easily and simply produced, consequently resulting in selective palladium (Pd) catalyst deposition by reduction. The successive electrolessplating on Pd catalysts and electroplating on electrolessplated pattern were possible. Furthermore, the electromagnetic interference shielding efficiencies of the metal mesh patterns with various characteristic length scales of line width and thickness were investigated.