Dislocation-independent mobility in lattice-mismatched epitaxy: application to GaN
Lattice-mismatched epitaxy produces a high concentration of dislocations ( N dis) in the interface region, and this region is often highly conductive, due to donor ( N D) decoration of the dislocations. Here we show that a simple postulate, N D= α( N dis/ c), where c is the lattice constant and α a...
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Published in | Solid state communications Vol. 117; no. 10; pp. 571 - 575 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Oxford
Elsevier Ltd
01.02.2001
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Lattice-mismatched epitaxy produces a high concentration of dislocations (
N
dis) in the interface region, and this region is often highly conductive, due to donor (
N
D) decoration of the dislocations. Here we show that a simple postulate,
N
D=
α(
N
dis/
c), where
c is the lattice constant and
α a constant of order 1–2, predicts a nearly constant low-temperature mobility, independent of
N
dis. This prediction is experimentally verified in GaN grown on Al
2O
3, and is also applied to other mismatched systems. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0038-1098 1879-2766 |
DOI: | 10.1016/S0038-1098(01)00010-2 |