Dislocation-independent mobility in lattice-mismatched epitaxy: application to GaN

Lattice-mismatched epitaxy produces a high concentration of dislocations ( N dis) in the interface region, and this region is often highly conductive, due to donor ( N D) decoration of the dislocations. Here we show that a simple postulate, N D= α( N dis/ c), where c is the lattice constant and α a...

Full description

Saved in:
Bibliographic Details
Published inSolid state communications Vol. 117; no. 10; pp. 571 - 575
Main Authors Look, D.C., Stutz, C.E., Molnar, R.J., Saarinen, K., Liliental-Weber, Z.
Format Journal Article
LanguageEnglish
Published Oxford Elsevier Ltd 01.02.2001
Elsevier
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Lattice-mismatched epitaxy produces a high concentration of dislocations ( N dis) in the interface region, and this region is often highly conductive, due to donor ( N D) decoration of the dislocations. Here we show that a simple postulate, N D= α( N dis/ c), where c is the lattice constant and α a constant of order 1–2, predicts a nearly constant low-temperature mobility, independent of N dis. This prediction is experimentally verified in GaN grown on Al 2O 3, and is also applied to other mismatched systems.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0038-1098
1879-2766
DOI:10.1016/S0038-1098(01)00010-2