Role of surface amorphous film in high-resolution high-angle annular dark field STEM imaging

A different scheme for high-angle annular dark-field scanning transmission electron microscopy image calculation of multilayers, such as a crystal covered by amorphous films, has been developed, in which intensities of electrons collected by an annular detector at each layer are evaluated by two kin...

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Bibliographic Details
Published inUltramicroscopy Vol. 99; no. 2; pp. 125 - 135
Main Authors Yamazaki, T., Watanabe, K., Nakanishi, N., Hashimoto, I.
Format Journal Article
LanguageEnglish
Published Netherlands Elsevier B.V 01.05.2004
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Summary:A different scheme for high-angle annular dark-field scanning transmission electron microscopy image calculation of multilayers, such as a crystal covered by amorphous films, has been developed, in which intensities of electrons collected by an annular detector at each layer are evaluated by two kinds of optical potential for thermal diffuse scattering on the layer-by-layer representation. One beam condition caused by an amorphous structure changes the present method into a simplified method. Through a molecular dynamics study of amorphous SiO 2, it is found that an off-axis cristobalite, regarded as one-beam condition, can be used for a model of amorphous SiO 2 structure. Furthermore, we demonstrate how surface amorphous films adhering to a crystal reduce image contrast and show that a top surface amorphous film acts as changing defocus in coherent convergent electron beam.
Bibliography:ObjectType-Article-1
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content type line 23
ISSN:0304-3991
1879-2723
DOI:10.1016/j.ultramic.2003.12.001