Field emission properties of the globe-like diamond microcrystalline aggregate films grown by MPCVD

The globe-like diamond microcrystalline aggregate films were fabricated by microwave plasma chemical vapor deposition (MPCVD) method and the field emission properties were investigated using a diode structure in vacuum. It was found that the films had a complex structure with globe-like microcrystal...

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Bibliographic Details
Published inPhysica. B, Condensed matter Vol. 405; no. 1; pp. 318 - 321
Main Authors Gao, Jinhai, Zhao, Limin, Hao, Haoshan
Format Journal Article
LanguageEnglish
Published Kidlington Elsevier B.V 2010
Elsevier
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Summary:The globe-like diamond microcrystalline aggregate films were fabricated by microwave plasma chemical vapor deposition (MPCVD) method and the field emission properties were investigated using a diode structure in vacuum. It was found that the films had a complex structure with globe-like microcrystalline diamond aggregations grown on the a-C surface and these films exhibited good electron emission properties and stability. The turn-on field of 1.1 V/μm and the current density of 6.6 mA/cm 2 were obtained for these diamond microcrystalline aggregate films at the electric field of 2.73 V/μm.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0921-4526
1873-2135
DOI:10.1016/j.physb.2009.08.081