Field emission properties of the globe-like diamond microcrystalline aggregate films grown by MPCVD
The globe-like diamond microcrystalline aggregate films were fabricated by microwave plasma chemical vapor deposition (MPCVD) method and the field emission properties were investigated using a diode structure in vacuum. It was found that the films had a complex structure with globe-like microcrystal...
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Published in | Physica. B, Condensed matter Vol. 405; no. 1; pp. 318 - 321 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Kidlington
Elsevier B.V
2010
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | The globe-like diamond microcrystalline aggregate films were fabricated by microwave plasma chemical vapor deposition (MPCVD) method and the field emission properties were investigated using a diode structure in vacuum. It was found that the films had a complex structure with globe-like microcrystalline diamond aggregations grown on the a-C surface and these films exhibited good electron emission properties and stability. The turn-on field of 1.1
V/μm and the current density of 6.6
mA/cm
2 were obtained for these diamond microcrystalline aggregate films at the electric field of 2.73
V/μm. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0921-4526 1873-2135 |
DOI: | 10.1016/j.physb.2009.08.081 |