Kinetic model for separation of particle mixtures by interfacial partitioning

A mechanistic study is presented on the partition behavior of mixtures of particles in interfacial partitioning with liquid two‐phase systems. A model is developed based on a mechanism of competitive adsorption of particles at the liquid‐liquid interface. In this model, it is assumed that partitioni...

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Published inAIChE journal Vol. 50; no. 6; pp. 1156 - 1168
Main Authors Hoeben, M. A., van der Lans, R. G. J. M., van der Wielen, L. A. M., Kwant, G.
Format Journal Article
LanguageEnglish
Published Hoboken Wiley Subscription Services, Inc., A Wiley Company 01.06.2004
Wiley Subscription Services
American Institute of Chemical Engineers
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Summary:A mechanistic study is presented on the partition behavior of mixtures of particles in interfacial partitioning with liquid two‐phase systems. A model is developed based on a mechanism of competitive adsorption of particles at the liquid‐liquid interface. In this model, it is assumed that partitioning is the result of a dynamic process of continuous adsorption and desorption of particles at droplet interfaces. It is shown that under certain conditions such a process can be described by means of Langmuir‐type adsorption isotherms. The model is tested with partition data of mixtures of ampicillin and phenylglycine crystals in a water/n‐pentane system, which leads to a reasonable quantitative description. The results indicate that for this particular system, adsorption of crystals at the interface occurs up to amounts that are needed for a monolayer coverage. In case larger amounts of crystals are present, partitioning of particles is subject to a competition for the available interfacial area. In such a case, the kinetics of adsorption and desorption of the particles to the interface seem to differ from a situation where the interface is partly uncovered. © 2004 American Institute of Chemical Engineers AIChE J, 50: 1156–1168, 2004
Bibliography:Dutch Ministries of Economic Affairs, Education and Agriculture
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ISSN:0001-1541
1547-5905
DOI:10.1002/aic.10105