Structure and properties of phosphorus-carbide thin solid films

• Published in: Thin solid films Vol. 548; no. 2; pp. 247 - 254
• Main Authors: Furlan, A., Gueorguiev, G.K., Czigány, Zs, Darakchieva, V., Braun, S., Correia, M.R., Högberg, H., Hultman, L.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 02.12.2013; Elsevier
• Subjects: Carbon; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Deposition by sputtering; Engineering physics; Exact sciences and technology; Fullerenes and related materials; diamonds, graphite; magnetron sputtering; Material physics with surface physics; Materialfysik med ytfysik; Materials science; Mechanical and acoustical properties; Methods of deposition of films and coatings; film growth and epitaxy; Phosphorus; Phosphorus carbide; Physical properties of thin films, nonelectronic; Physics; Raman spectroscopy; Specific materials; Sputtering; Structure; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); TECHNOLOGY; TEKNIKVETENSKAP; Teknisk fysik; Thin film structure and morphology; Thin films; Transmission electron microscopy; X-ray photoelectron spectroscopy; Thin films; Transmission electron microscopy; Phosphorus; Structure; Raman spectroscopy; Carbon; Sputtering; X-ray photoelectron spectroscopy; Order-disorder transformations; Roughness; Cathode sputtering; Hardness testing; Physical vapor deposition; Ordering; Elastic analysis; Nanohardness; Scanning electron microscopy; X-ray microscopy; Nanoindentation; Mechanical properties; Hardness; Fullerenes; Reactive sputtering; Hardness indentation; Sputter deposition; X-ray photoelectron spectra
• ISSN: 0040-6090; 1879-2731; 1879-2731
• DOI: 10.1016/j.tsf.2013.10.010

Phosphorus-carbide (CPx) thin solid films have been deposited by unbalanced reactive magnetron sputtering from a compound C-P target and investigated by transmission electron microscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, elastic recoil detection analysis, Raman scattering spectroscopy, nanoindentation, and four-point electrical probe techniques. CPx films with x=0.1 deposited at 300°C exhibit a structure with elements of short-range ordering in the form of curved and inter-locked fullerene-like fragments. The films have a hardness of 34.4GPa, elastic recovery of 72% and surface roughness of 0.5nm. Higher deposition temperatures yield CPx films with an increasingly amorphous structure, and reduced hardness. •Phosphorus-carbide (CPx) thin solid films have been deposited by magnetron sputtering.•Structural and chemical bonding properties were investigated.•CPx thin solid films show high mechanical resiliency.•Low temperature favors fullerene-like structural properties.