Plasma diagnostics for understanding the plasma-surface interaction in HiPIMS discharges: a review

The physical and chemical aspects of plasma-surface interaction in high-power impulse magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various plasma diagnostic methods representing the important sputtering discharge regions, namely the cathode vicinity, plasma bulk, and...

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Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 47; no. 22; pp. 1 - 46
Main Authors Britun, Nikolay, Minea, Tiberiu, Konstantinidis, Stephanos, Snyders, Rony
Format Journal Article
LanguageEnglish
Published IOP Publishing 04.06.2014
Subjects
Cathode sputtering
Cathodes
high-power impulse magnetron sputtering
Impulses
Magnetron sputtering
Plasma (physics)
Plasma diagnostics
plasma-surface interaction
reactive sputtering
spectroscopy
Sputtering
Strategy
time-resolved
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Summary:The physical and chemical aspects of plasma-surface interaction in high-power impulse magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various plasma diagnostic methods representing the important sputtering discharge regions, namely the cathode vicinity, plasma bulk, and substrate vicinity, are reported. After a detailed introduction to the problem and description of the plasma characterization methods suitable for pulsed magnetron discharge analysis, an overview of the recent plasma diagnostics achievements in both non-reactive and reactive HiPIMS discharges is presented. Finally, the conclusions and perspectives suggesting possible directions and research strategies for increasing our knowledge in this domain are given.
Bibliography:JPhysD-100943.R1
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ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/47/22/224001