An XPS study of the angular dependence of preferential sputtering and ion-induced reduction in lead oxide-containing glasses

• Published in: Vacuum Vol. 34; no. 6; pp. 659 - 662
• Main Authors: Christie, AB, Sutherland, I, Walls, JM
• Format: Journal Article
• Language: English
• Published: Oxford Elsevier Ltd 01.06.1984; Elsevier
• Subjects: Applied sciences; Building materials. Ceramics. Glasses; Chemical industry and chemicals; Exact sciences and technology; Glasses; Special glasses; Photoelectron spectrometry; X ray; Ion beam sputtering; Glass; Lead glass
• ISSN: 0042-207X; 1879-2715
• DOI: 10.1016/0042-207X(84)90058-7

The power of XPS for the characterization of low energy ion-irradiated surfaces is demonstrated through the detailed study of surface stoichiometry and oxidation state changes in a lead oxide-containing glass under 5 keV argon-ion bombardment. The variation of extent of ion-induced reduction of lead oxide to lead metal, and of preferential sputtering of lead over silicon, with the angle of incidence of the primary ion beam (from normal incidence to 75°to the normal) was investigated. Angle-resolved XPS studies at sputter-equilibrium reveal the presence of a uniform metallic lead-containing ion-damaged overlayer, and a non-uniform lead oxide depleted overlayer under all conditions. The extent of both preferential sputtering of lead and ion-induced reduction to lead metal is shown to be least for grazing angles of ion incidence, and greatest for normal incidence.