Nano silver-catalyzed chemical etching of polycrystalline silicon wafer for solar cell application

Silver nanoparticles were deposited on the surface of polycrystalline silicon wafer via vacuum thermal evaporation and metal-catalyzed chemical etching (MCCE) was conducted in a HF-H2O2 etching system. Treatment of the etched silicon wafer with HF transformed the textured structure on the surface fr...

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Bibliographic Details
Published inAIP advances Vol. 6; no. 3; pp. 035320 - 035320-4
Main Authors Chen, S. R., Liang, Z. C., Wang, D. L.
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 01.03.2016
AIP Publishing LLC
Subjects
Chemical etching
Etching
Hafnium
Hydrogen peroxide
Nanoparticles
Nanorods
Organic chemistry
Photovoltaic cells
Polycrystals
Silicon
Silicon wafers
Silver
Size distribution
Solar cells
Vacuum thermal evaporation
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Summary:Silver nanoparticles were deposited on the surface of polycrystalline silicon wafer via vacuum thermal evaporation and metal-catalyzed chemical etching (MCCE) was conducted in a HF-H2O2 etching system. Treatment of the etched silicon wafer with HF transformed the textured structure on the surface from nanorods into nanocones. An etching time of 30 s and treatment with HF resulted in nanocones with uniform size distribution and a reflectivity as low as 1.98% across a spectral range from 300 to 1000 nm.
ISSN:2158-3226
2158-3226
DOI:10.1063/1.4945398