Near-room temperature single-domain epitaxy of reactively sputtered ZnO films

Single-domain epitaxial ZnO films are grown near-room temperature (below 40 °C) on (0 0 0 1)-sapphire using reactive magnetron sputtering of a zinc target in the transition between the metallic and compound sputtering regimes. As the oxygen content in the reactive gas mixture is increased, the in-pl...

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Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 46; no. 23; pp. 235107 - 235113
Main Authors Chamorro, W, Horwat, D, Pigeat, P, Miska, P, Migot, S, Soldera, F, Boulet, P, Mücklich, F
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 13.06.2013
Institute of Physics
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Summary:Single-domain epitaxial ZnO films are grown near-room temperature (below 40 °C) on (0 0 0 1)-sapphire using reactive magnetron sputtering of a zinc target in the transition between the metallic and compound sputtering regimes. As the oxygen content in the reactive gas mixture is increased, the in-plane six-fold symmetry of hexagonal wurtzite ZnO, probed by -scan measurements, develops. Transmission electron microscopy analyses confirm that single-domain epitaxial layers are formed. This is accompanied by the incorporation of oxygen interstitial defects associated with oxygen over-stoichiometry and by compressive stresses. A model is proposed to explain the observed behaviour based on the transformation of the kinetic energy of fast oxygen particles into the mobility of the adatoms.
ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/46/23/235107