FEA-based heat management of a monochromator at the High Energy Photon Source

The finite element method (FEA) was used for thermal mechanical behavior analysis of a monochromator subjected to high heat load for a beamline at the High Energy Photon Source (HEPS). Without using reflection mirror, high energy photons deposit directly on the first crystal of DCM (Double Crystal M...

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Bibliographic Details
Published inAIP advances Vol. 9; no. 8; pp. 085007 - 085007-8
Main Author Wang, Huirong
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 01.08.2019
AIP Publishing LLC
Subjects
Cooling
Cooling effects
Crystals
Deformation effects
Deformation mechanisms
Energy management
Finite element method
Mechanical properties
Monochromators
Optical components
Photons
Thermal management
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Summary:The finite element method (FEA) was used for thermal mechanical behavior analysis of a monochromator subjected to high heat load for a beamline at the High Energy Photon Source (HEPS). Without using reflection mirror, high energy photons deposit directly on the first crystal of DCM (Double Crystal Monochromator) with power density up to 69W/mm2. This paper introduces an indirect cooling structure with multi-channels cut inside the cooling blocks, which can effectively reduce the crystal deformation caused by high heat deposition. The effects of power and power density on crystal temperature and deformation are compared and its variation discipline with the distance between monochromator and light source (undulator) are studied. The research results have reference significance for thermal management of monochromators as well as other optical elements in HEPS.
ISSN:2158-3226
2158-3226
DOI:10.1063/1.5109807