Magnetoexciton–photon coupling in a semiconductor quantum microcavity subjected to a parallel electric field
The strong coupling of light with magnetoexcitons in a quantum well within a semiconductor microcavity under the action of an electric field parallel to the quantum well plane, is theoretically studied. Such a phenomenon is described within the Stahl–Balslev real-space density-matrix approach using...
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Published in | AIP advances Vol. 10; no. 6; pp. 065223 - 065223-8 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Melville
American Institute of Physics
01.06.2020
AIP Publishing LLC |
Subjects | |
Online Access | Get full text |
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Summary: | The strong coupling of light with magnetoexcitons in a quantum well within a semiconductor microcavity under the action of an electric field parallel to the quantum well plane, is theoretically studied. Such a phenomenon is described within the Stahl–Balslev real-space density-matrix approach using a system of coupled equations for the coherent-wave amplitude and the electromagnetic fields. In the study, both s- and p-polarization geometries as well as the Coulomb interaction potential between electrons and holes are considered. It is shown that the optical reflectivity spectra for a heterostructure, having an InGaAs/GaAs quantum well inside the semiconductor microcavity with Bragg mirrors of alternating GaAs and InGaAs layers, exhibit well-discernible resonant dips. The strong magnetoexciton–photon coupling occurs when the magnetoexciton resonance frequency and that of the confined photon are close to each other. The application of a static electric field, parallel to the interfaces of the layers, allows for the optical excitation of magnetoexcitons, having nonzero angular momentum projection, and noticeably alters the resonance structure of both s- and p-polarization optical spectra. The strong magnetoexciton–photon coupling is observed until sufficiently large magnitudes of the applied parallel electric field are reached. |
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ISSN: | 2158-3226 2158-3226 |
DOI: | 10.1063/5.0011533 |