Self-organized van der Waals epitaxy of layered chalcogenide structures
Highly oriented Sb2Te3 films were successfully deposited by RF‐magnetron sputtering on both crystalline and amorphous substrates. A novel deposition mechanism and method are proposed based on van der Waals epitaxy. Due to the selective reactivity of the top surface atoms of the substrate with sputte...
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Published in | Physica Status Solidi. B: Basic Solid State Physics Vol. 252; no. 10; pp. 2151 - 2158 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Blackwell Publishing Ltd
01.10.2015
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Subjects | |
Online Access | Get full text |
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Summary: | Highly oriented Sb2Te3 films were successfully deposited by RF‐magnetron sputtering on both crystalline and amorphous substrates. A novel deposition mechanism and method are proposed based on van der Waals epitaxy. Due to the selective reactivity of the top surface atoms of the substrate with sputtered atoms, a Te monolayer is the first layer formed on the substrate, resulting in the subsequent layer‐by‐layer growth of the Sb2Te3 film independent of the crystallinity of the substrates. We believe that this method can be applied to the mass production of a wide range of various van der Waals solids, such as transition metal dichalcogenides and topological insulators for future electronics devices.
Self‐organized van‐der‐Waals epitaxy was proposed as a possible growth mechanism of highly‐oriented layered chalcogenide materials, like Sb2Te3, by sputtering. It was found that depending on the composition of the substrate, there existed a selectivity of the chemical reaction between the film and substrate elements that resulted in the preferential formation of a Te monolayer and subsequent layer‐by‐layer growth of Sb2Te3. This novel mechanism enables one to fabricate highly‐oriented chalcogenide films over a large area and can be applied to the mass production of a wide range of various van‐der‐Waals solids, such as transition metal dichalcogenides and topological insulators for future electronics devices. |
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Bibliography: | ArticleID:PSSB201552335 istex:7A8199437BDFC6A15A4CBA9C1EEF35DA4C2DDF95 ark:/67375/WNG-SNXTDRH1-M ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0370-1972 1521-3951 |
DOI: | 10.1002/pssb.201552335 |