Niobium Silicon Alloys for Kinetic Inductance Detectors
We are studying the properties of Niobium Silicon amorphous alloys as a candidate material for the fabrication of highly sensitive kinetic inductance detectors (KID), optimized for very low optical loads. As in the case of other composite materials, the NbSi properties can be changed by varying the...
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Published in | Journal of low temperature physics Vol. 176; no. 3-4; pp. 518 - 523 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Boston
Springer US
2014
Springer Verlag (Germany) |
Subjects | |
Online Access | Get full text |
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Summary: | We are studying the properties of Niobium Silicon amorphous alloys as a candidate material for the fabrication of highly sensitive kinetic inductance detectors (KID), optimized for very low optical loads. As in the case of other composite materials, the NbSi properties can be changed by varying the relative amounts of its components. Using a NbSi film with T
c
= 1 K we have been able to obtain the first NbSi resonators, observe an optical response and acquire a spectrum in the band 50–300 GHz. The data taken show that this material has very high kinetic inductance
L
k
and normal state surface resistivity
ρ
n
. These properties are ideal for the development of KID. More measurements are planned to further characterize the NbSi alloy and fully investigate its potential. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0022-2291 1573-7357 |
DOI: | 10.1007/s10909-013-1072-6 |