Depletion layer and contact capacitance in non-uniformly doped semiconductors
We consider the dependence of the capacitance C of the semiconductor depletion layer versus the contact bias V. When the concentration of doping impurities varies in the plane parallel to the contact, we show that the standard Schottky dependence C exp -2 (V) is no longer a straight line. We compute...
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Published in | Journal of physics. D, Applied physics Vol. 35; no. 22; pp. 2988 - 2993 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Bristol
IOP Publishing
21.11.2002
Institute of Physics |
Subjects | |
Online Access | Get full text |
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Summary: | We consider the dependence of the capacitance C of the semiconductor depletion layer versus the contact bias V. When the concentration of doping impurities varies in the plane parallel to the contact, we show that the standard Schottky dependence C exp -2 (V) is no longer a straight line. We compute the effective concentration N(eff) from the slope of the dependence C exp -2 (V) by using the perturbation and variation methods and compare N(eff) with previous theoretical and experimental data. (Author) |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0022-3727 1361-6463 |
DOI: | 10.1088/0022-3727/35/22/313 |