The effect of germanium on the Co-SiGe thin-film reaction

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Bibliographic Details
Published inJournal of synchrotron radiation Vol. 6; no. 3; pp. 521 - 523
Main Authors Boyanov, B. I., Goeller, P. T., Sayers, D. E., Nemanich, R. J.
Format Journal Article
LanguageEnglish
Published 5 Abbey Square, Chester, Cheshire CH1 2HU, England International Union of Crystallography 01.05.1999
Subjects
cobalt silicide
MBE
segregation
SiGe
thickness effects
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content type line 23
ISSN:1600-5775
0909-0495
1600-5775
DOI:10.1107/S0909049599000060