Effect of a surface pre-treatment on graphene growth using a SiC substrate

This study reports surface pre-treatment techniques for the formation of a high-quality graphene layer on a SiC surface. It is demonstrated that silicon passivation of SiC surface using a silane flow and subsequent sacrificial oxidation can significantly improve the surface condition of a graphene l...

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Bibliographic Details
Published inMicroelectronic engineering Vol. 87; no. 10; pp. 2002 - 2007
Main Authors Seo, Jun-Ho, Kang, Byung-Jin, Mun, Jeong Hun, Lim, Sung-Kyu, Cho, Byung Jin
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.10.2010
Elsevier
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Summary:This study reports surface pre-treatment techniques for the formation of a high-quality graphene layer on a SiC surface. It is demonstrated that silicon passivation of SiC surface using a silane flow and subsequent sacrificial oxidation can significantly improve the surface condition of a graphene layer on SiC by ensuring much fewer carbon dumps and wrinkles, reducing the electrical resistance, and providing smoother surface roughness and a larger domain size. The effect of in situ cleaning by a SF 6 treatment before graphitization was also studied. It was found that in situ cleaning using SF 6 gas can be a simple and effective means of improving the quality of a graphene layer grown on SiC. The results of this study suggest that a surface treatment before graphitization is the key to synthesize high-quality epitaxial graphene layer.
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ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2009.12.072