Effect of a surface pre-treatment on graphene growth using a SiC substrate
This study reports surface pre-treatment techniques for the formation of a high-quality graphene layer on a SiC surface. It is demonstrated that silicon passivation of SiC surface using a silane flow and subsequent sacrificial oxidation can significantly improve the surface condition of a graphene l...
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Published in | Microelectronic engineering Vol. 87; no. 10; pp. 2002 - 2007 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
01.10.2010
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | This study reports surface pre-treatment techniques for the formation of a high-quality graphene layer on a SiC surface. It is demonstrated that silicon passivation of SiC surface using a silane flow and subsequent sacrificial oxidation can significantly improve the surface condition of a graphene layer on SiC by ensuring much fewer carbon dumps and wrinkles, reducing the electrical resistance, and providing smoother surface roughness and a larger domain size. The effect of in situ cleaning by a SF
6 treatment before graphitization was also studied. It was found that in situ cleaning using SF
6 gas can be a simple and effective means of improving the quality of a graphene layer grown on SiC. The results of this study suggest that a surface treatment before graphitization is the key to synthesize high-quality epitaxial graphene layer. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0167-9317 1873-5568 |
DOI: | 10.1016/j.mee.2009.12.072 |