Optical properties of zinc nitride formed by molten salt electrochemical process

• Published in: Thin solid films Vol. 492; no. 1; pp. 88 - 92
• Main Authors: Toyoura, Kazuaki, Tsujimura, Hiroyuki, Goto, Takuya, Hachiya, Kan, Hagiwara, Rika, Ito, Yasuhiko
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 01.12.2005; Elsevier Science
• Subjects: Cross-disciplinary physics: materials science; rheology; Electrochemistry; Electrodeposition, electroplating; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Nitrides; Optical properties; Physics; Zinc; Electrochemistry; Nitrides; Optical properties; Zinc; Cubic lattices; Zinc nitrides; Inorganic compounds; Semiconductor materials; Transition element compounds; Thick films; Molten salts; Binary compounds; XRD; Experimental study; Reflectivity; Monocrystals; Near infrared spectrum; Crystal growth from solutions; Electrodeposition; Ultraviolet visible spectrum; X-ray photoelectron spectra
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2005.06.057

We formed a Zn 3N 2 film by potentiostatic electrolysis of a zinc electrode at 1.6 V (vs. Li +/Li) in a LiCl–KCl–Li 3N melt at 673 K. From the X-ray diffraction analysis, the obtained film was found to be a single phase of Zn 3N 2. From the X-ray photoelectron spectroscopy analysis, in the outer surface of the film, small amounts of Zn(OH) 2 and ZnO were observed, which are believed to form after electrolysis. As a result of reflectance measurement in the ultraviolet, visible and near infrared region, it was clarified that Zn 3N 2 has a direct band gap of 1.01 eV.