Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication

• Published in: Progress in polymer science Vol. 54-55; pp. 76 - 127
• Main Authors: Ji, Shengxiang, Wan, Lei, Liu, Chi-Chun, Nealey, Paul F.
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.03.2016
• Subjects: Bit-patterned media; Block copolymer lithography; Block copolymers; Chemical pattern; Data storage; Directed self-assembly; Lithography; Nanofabrication; Nanostructure; Pattern transfer; Photolithography; Platforms; Self assembly; Semiconductors; Block copolymer lithography; Nanofabrication; Pattern transfer; Chemical pattern; Directed self-assembly; Bit-patterned media

Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constr...