Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication

Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constr...

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Bibliographic Details
Published inProgress in polymer science Vol. 54-55; pp. 76 - 127
Main Authors Ji, Shengxiang, Wan, Lei, Liu, Chi-Chun, Nealey, Paul F.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.03.2016
Subjects
Bit-patterned media
Block copolymer lithography
Block copolymers
Chemical pattern
Data storage
Directed self-assembly
Lithography
Nanofabrication
Nanostructure
Pattern transfer
Photolithography
Platforms
Self assembly
Semiconductors
Block copolymer lithography
Nanofabrication
Pattern transfer
Chemical pattern
Directed self-assembly
Bit-patterned media
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Summary:Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constraints for applications in semiconductors and data storage. DSA attracts attention from both academia and industry and tremendous progress has been achieved in the past decade. This review highlights the development of DSA with an emphasis on efforts toward the integration of block copolymer lithography into the current lithographic process for the fabrication of devices for integrated circuits and bit-patterned media.
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ISSN:0079-6700
1873-1619
DOI:10.1016/j.progpolymsci.2015.10.006