Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication

Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constr...

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Bibliographic Details
Published inProgress in polymer science Vol. 54-55; pp. 76 - 127
Main Authors Ji, Shengxiang, Wan, Lei, Liu, Chi-Chun, Nealey, Paul F.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.03.2016
Subjects
Bit-patterned media
Block copolymer lithography
Block copolymers
Chemical pattern
Data storage
Directed self-assembly
Lithography
Nanofabrication
Nanostructure
Pattern transfer
Photolithography
Platforms
Self assembly
Semiconductors
Block copolymer lithography
Nanofabrication
Pattern transfer
Chemical pattern
Directed self-assembly
Bit-patterned media
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Abstract Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constraints for applications in semiconductors and data storage. DSA attracts attention from both academia and industry and tremendous progress has been achieved in the past decade. This review highlights the development of DSA with an emphasis on efforts toward the integration of block copolymer lithography into the current lithographic process for the fabrication of devices for integrated circuits and bit-patterned media.
AbstractList Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constraints for applications in semiconductors and data storage. DSA attracts attention from both academia and industry and tremendous progress has been achieved in the past decade. This review highlights the development of DSA with an emphasis on efforts toward the integration of block copolymer lithography into the current lithographic process for the fabrication of devices for integrated circuits and bit-patterned media.
Author Liu, Chi-Chun
Nealey, Paul F.
Ji, Shengxiang
Wan, Lei
Author_xml – sequence: 1
  givenname: Shengxiang
  surname: Ji
  fullname: Ji, Shengxiang
  email: sji@ciac.ac.cn
  organization: Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, China
– sequence: 2
  givenname: Lei
  surname: Wan
  fullname: Wan, Lei
  email: lei.wan@hgst.com
  organization: HGST-A Western Digital Company, 3403 Yerba Buena Road, San Jose, CA 95135, USA
– sequence: 3
  givenname: Chi-Chun
  surname: Liu
  fullname: Liu, Chi-Chun
  email: cliu@us.ibm.com
  organization: IBM Albany NanoTech, 257 Fuller Road, Albany, NY 12203, USA
– sequence: 4
  givenname: Paul F.
  surname: Nealey
  fullname: Nealey, Paul F.
  email: nealey@uchicago.edu
  organization: Institute for Molecular Engineering, University of Chicago, 5747 South Ellis Avenue, Chicago, IL 60637, USA
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Thu Apr 24 23:09:05 EDT 2025
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Fri Feb 23 02:25:14 EST 2024
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Keywords Block copolymer lithography
Nanofabrication
Pattern transfer
Chemical pattern
Directed self-assembly
Bit-patterned media
Language English
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  text: March-April 2016
PublicationDecade 2010
PublicationTitle Progress in polymer science
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Snippet Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines...
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SubjectTerms Bit-patterned media
Block copolymer lithography
Block copolymers
Chemical pattern
Data storage
Directed self-assembly
Lithography
Nanofabrication
Nanostructure
Pattern transfer
Photolithography
Platforms
Self assembly
Semiconductors
Title Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
URI https://dx.doi.org/10.1016/j.progpolymsci.2015.10.006
https://www.proquest.com/docview/1808103667
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