Electrical properties of low temperature deposited amorphous barium titanate thin films as dielectrics for integrated capacitors
Amorphous barium titanate (a-BaTiO 3) thin films were deposited by the RF magnetron sputtering technique. The films were grown directly on copper substrates which were maintained at low temperature during deposition (water-cooled substrates). We studied the permittivity (dielectric constant and loss...
Saved in:
Published in | Thin solid films Vol. 504; no. 1; pp. 201 - 204 |
---|---|
Main Authors | , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Lausanne
Elsevier B.V
10.05.2006
Elsevier Science Elsevier |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Amorphous barium titanate (a-BaTiO
3) thin films were deposited by the RF magnetron sputtering technique. The films were grown directly on copper substrates which were maintained at low temperature during deposition (water-cooled substrates). We studied the permittivity (dielectric constant and loss) in the 0.1 Hz–100 kHz range, from −
100 to 225 °C. Leakage currents (DC conductivity) were also studied as a function of the applied field and temperature. At room temperature the dielectric constant is 18.5 (100 kHz), the dissipation factor is 4
×
10
−
3
and the conductivity is 6
×
10
−
16
S/cm (2.7 μm thick films). A dielectric dispersion is observed at low frequencies that becomes pronounced when the temperature is increased. |
---|---|
Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 SourceType-Scholarly Journals-2 ObjectType-Feature-2 ObjectType-Conference Paper-1 SourceType-Conference Papers & Proceedings-1 ObjectType-Article-3 |
ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2005.09.125 |