APA (7th ed.) Citation

Wang, W., Lu, X., Wu, X., Zhang, Y., Wang, R., Yang, D., & Pi, X. (2023). Chemical–Mechanical Polishing of 4H Silicon Carbide Wafers. Advanced materials interfaces, 10(13), -n/a. https://doi.org/10.1002/admi.202202369

Chicago Style (17th ed.) Citation

Wang, Wantang, Xuesong Lu, Xinke Wu, Yiqiang Zhang, Rong Wang, Deren Yang, and Xiaodong Pi. "Chemical–Mechanical Polishing of 4H Silicon Carbide Wafers." Advanced Materials Interfaces 10, no. 13 (2023): -n/a. https://doi.org/10.1002/admi.202202369.

MLA (9th ed.) Citation

Wang, Wantang, et al. "Chemical–Mechanical Polishing of 4H Silicon Carbide Wafers." Advanced Materials Interfaces, vol. 10, no. 13, 2023, pp. -n/a, https://doi.org/10.1002/admi.202202369.