Titania-assisted electron-beam and synchrotron lithography

• Published in: Nanotechnology Vol. 21; no. 31; p. 315301
• Main Authors: Skorb, Ekaterina V, Grützmacher, Detlev, Dais, Christian, Guzenko, Vitaliy A, Sokolov, Valeriy G, Gaevskaya, Tatjana V, Sviridov, Dmitry V
• Format: Journal Article
• Language: English
• Published: England IOP Publishing 06.08.2010
• Subjects: Imaging; Lithography; Nanoparticles; Nanotechnology; Nickel; Palladium; Synchrotrons; Titanium dioxide

Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel image...