Titania-assisted electron-beam and synchrotron lithography
Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel image...
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Published in | Nanotechnology Vol. 21; no. 31; p. 315301 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
England
IOP Publishing
06.08.2010
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Subjects | |
Online Access | Get full text |
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Summary: | Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel images with resolution down to approximately 100 nm. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 ObjectType-Article-2 ObjectType-Feature-1 |
ISSN: | 0957-4484 1361-6528 |
DOI: | 10.1088/0957-4484/21/31/315301 |