Effect of Spin-Glass Ordering on Conduction in a-Si1-cMnc near the Metal-Insulator Transition

The electrical conductivity and magnetoresistance of amorphous Si films implanted by Mn ions up to a concentration of 22 at% are investigated near the metal–insulator transition (MIT). We find that there is a characteristic temperature TSG = 6 to 20 K (dependent on the Mn concentration) which separa...

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Bibliographic Details
Published inphysica status solidi (b) Vol. 205; no. 1; pp. 299 - 303
Main Authors Yakimov, A. I., Dvurechenskii, A. V., Adkins, C. J.
Format Journal Article
LanguageEnglish
Published Berlin WILEY-VCH Verlag 01.01.1998
WILEY‐VCH Verlag
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Summary:The electrical conductivity and magnetoresistance of amorphous Si films implanted by Mn ions up to a concentration of 22 at% are investigated near the metal–insulator transition (MIT). We find that there is a characteristic temperature TSG = 6 to 20 K (dependent on the Mn concentration) which separates two different conductivity behaviours. As temperature is reduced below TSG on the insulating side of the MIT, the conductivity mechanism is found to change from variable‐range hopping to conductivity with constant activation energy ΔE which decreases linearly in a magnetic field. The activation energy of hopping determined from the data above TSG, on approaching TSG, turns out to be smaller than ΔE. In the metallic regime at T < TSG, we observe a shift of the MIT towards higher impurity concentration in respect with that determined from the data at T > TSG. The low‐temperature anomalies are ascribed to the spin‐glass transition caused by d–d interaction between Mn atoms.
Bibliography:istex:CEDA536D771D1650FF59141C111DA967712424A9
ArticleID:PSSB299
ark:/67375/WNG-JN3L0K18-0
ISSN:0370-1972
1521-3951
DOI:10.1002/(SICI)1521-3951(199801)205:1<299::AID-PSSB299>3.0.CO;2-0