Memory characteristics of a self-assembled monolayer of Pt nanoparticles as a charge trapping layer
A self-assembled monolayer of Pt nanoparticles (NPs) was studied as a charge trapping layer for non-volatile memory (NVM) applications. Pt NPs with a narrow size distribution (diameter ∼4 nm) were synthesized via an alcohol reduction method. The monolayer of these Pt NPs was immobilized on a SiO(2)...
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Published in | Nanotechnology Vol. 19; no. 30; pp. 305704 - 305704 (5) |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
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England
IOP Publishing
30.07.2008
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Abstract | A self-assembled monolayer of Pt nanoparticles (NPs) was studied as a charge trapping layer for non-volatile memory (NVM) applications. Pt NPs with a narrow size distribution (diameter ∼4 nm) were synthesized via an alcohol reduction method. The monolayer of these Pt NPs was immobilized on a SiO(2) substrate using poly(4-vinylpyridine) (P4VP) as a surface modifier. A metal-oxide-semiconductor (MOS) type memory device with Pt NPs exhibits a relatively large memory window of 5.8 V under ± 7 V for program/erase voltage. These results indicate that the self-assembled Pt NPs can be utilized for NVM devices. |
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AbstractList | A self-assembled monolayer of Pt nanoparticles (NPs) was studied as a charge trapping layer for non-volatile memory (NVM) applications. Pt NPs with a narrow size distribution (diameter ∼4 nm) were synthesized via an alcohol reduction method. The monolayer of these Pt NPs was immobilized on a SiO(2) substrate using poly(4-vinylpyridine) (P4VP) as a surface modifier. A metal-oxide-semiconductor (MOS) type memory device with Pt NPs exhibits a relatively large memory window of 5.8 V under ± 7 V for program/erase voltage. These results indicate that the self-assembled Pt NPs can be utilized for NVM devices. A self-assembled monolayer of Pt nanoparticles (NPs) was studied as a charge trapping layer for non-volatile memory (NVM) applications. Pt NPs with a narrow size distribution (diameter ~4 nm) were synthesized via an alcohol reduction method. The monolayer of these Pt NPs was immobilized on a SiO2 substrate using poly(4-vinylpyridine) (P4VP) as a surface modifier. A metal-oxide-semiconductor (MOS) type memory device with Pt NPs exhibits a relatively large memory window of 5.8 V under +/- 7 V for program/erase voltage. These results indicate that the self-assembled Pt NPs can be utilized for NVM devices. |
Author | Lee, Takhee Kim, Tae-Wook Chang, Man Choi, Hyejung Jung, Seung-Jae Choi, Byung-Sang Hwang, Hyunsang |
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BackLink | https://www.ncbi.nlm.nih.gov/pubmed/21828771$$D View this record in MEDLINE/PubMed |
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Cites_doi | 10.1002/ecjb.4420700407 10.1038/nnano.2006.55 10.1021/nl034008t 10.1109/TED.2003.812081 10.1063/1.116085 10.1021/jp013236d 10.3938/jkps.50.49 10.1063/1.119623 10.1016/j.jelechem.2004.09.012 10.1063/1.1795976 10.1016/j.susc.2006.11.064 10.1088/0268-1242/21/7/025 10.1063/1.2737362 10.1038/nnano.2007.380 10.1063/1.1846952 10.1007/s11664-005-0172-8 10.1002/(SICI)1096-9918(199908)28:1<245::AID-SIA586>3.0.CO;2-I 10.1021/jp983478m |
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