Characterization of NbTiN Thin Films Deposited on Various Substrates
Niobium titanium nitride (NbTiN) thin films were deposited on a selection of different substrates to explore the optimum depositing condition of high-quality NbTiN thin films. The NbTiN films deposited on MgO, Al 2 O 3 , and fused quartz substrates showed excellent superconducting properties with a...
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Published in | IEEE transactions on applied superconductivity Vol. 21; no. 3; pp. 139 - 142 |
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Main Authors | , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
New York, NY
IEEE
01.06.2011
Institute of Electrical and Electronics Engineers The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | Niobium titanium nitride (NbTiN) thin films were deposited on a selection of different substrates to explore the optimum depositing condition of high-quality NbTiN thin films. The NbTiN films deposited on MgO, Al 2 O 3 , and fused quartz substrates showed excellent superconducting properties with a high T C of 14.7 K, 14.5 K, 15.2 K, and low resistivity ρ 20 K of 55 μΩcm, 116 μΩcm, 78 μΩcm, respectively. The chemical composition, crystal structure, and relationship between superconducting properties and crystal structure were systematically investigated by changing the N 2 /(Ar+N 2 ) ratio in sputtering gases. The lattice parameter systematically changed as N 2 /(Ar+N 2 ) ratio was varied. We found that the superconducting properties depend on the lattice parameter, and the film with the best superconducting properties had a lattice parameter of 4.380 Å (on MgO), 4.345 Å (on Al 2 O 3 ), 4.335 Å (on fused quartz). |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1051-8223 1558-2515 |
DOI: | 10.1109/TASC.2010.2088350 |