Characterization of NbTiN Thin Films Deposited on Various Substrates

Niobium titanium nitride (NbTiN) thin films were deposited on a selection of different substrates to explore the optimum depositing condition of high-quality NbTiN thin films. The NbTiN films deposited on MgO, Al 2 O 3 , and fused quartz substrates showed excellent superconducting properties with a...

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Published inIEEE transactions on applied superconductivity Vol. 21; no. 3; pp. 139 - 142
Main Authors Makise, K, Terai, H, Takeda, M, Uzawa, Y, Zhen Wang
Format Journal Article Conference Proceeding
LanguageEnglish
Published New York, NY IEEE 01.06.2011
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:Niobium titanium nitride (NbTiN) thin films were deposited on a selection of different substrates to explore the optimum depositing condition of high-quality NbTiN thin films. The NbTiN films deposited on MgO, Al 2 O 3 , and fused quartz substrates showed excellent superconducting properties with a high T C of 14.7 K, 14.5 K, 15.2 K, and low resistivity ρ 20 K of 55 μΩcm, 116 μΩcm, 78 μΩcm, respectively. The chemical composition, crystal structure, and relationship between superconducting properties and crystal structure were systematically investigated by changing the N 2 /(Ar+N 2 ) ratio in sputtering gases. The lattice parameter systematically changed as N 2 /(Ar+N 2 ) ratio was varied. We found that the superconducting properties depend on the lattice parameter, and the film with the best superconducting properties had a lattice parameter of 4.380 Å (on MgO), 4.345 Å (on Al 2 O 3 ), 4.335 Å (on fused quartz).
Bibliography:ObjectType-Article-1
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content type line 23
ISSN:1051-8223
1558-2515
DOI:10.1109/TASC.2010.2088350