Subsurface damage from helium ions as a function of dose, beam energy, and dose rate
In recent years, helium ion microscopy has produced high resolution images with novel contrast mechanisms. However, when using any charged particle beam, one must consider the potential for sample damage. In this article, the authors will consider helium ion induced damage thresholds as compared to...
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Published in | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Vol. 27; no. 6; pp. 3244 - 3249 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
American Vacuum Society
01.11.2009
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Subjects | |
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Abstract | In recent years, helium ion microscopy has produced high resolution images with novel contrast mechanisms. However, when using any charged particle beam, one must consider the potential for sample damage. In this article, the authors will consider helium ion induced damage thresholds as compared to other more traditional charged-particle-beam technologies, as a function of dose, dose rate, and beam energy, and describe potential applications operating regimes. |
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AbstractList | In recent years, helium ion microscopy has produced high resolution images with novel contrast mechanisms. However, when using any charged particle beam, one must consider the potential for sample damage. In this article, the authors will consider helium ion induced damage thresholds as compared to other more traditional charged-particle-beam technologies, as a function of dose, dose rate, and beam energy, and describe potential applications operating regimes. |
Author | Greenzweig, Yuval Livengood, Richard Notte, John McVey, Shawn Tan, Shida |
Author_xml | – sequence: 1 givenname: Richard surname: Livengood fullname: Livengood, Richard organization: Intel Corporation, MS: SC9-68, Santa Clara, California 95054-1549 – sequence: 2 givenname: Shida surname: Tan fullname: Tan, Shida email: shida.tan@intel.com organization: Intel Corporation, MS: SC9-68, Santa Clara, California 95054-1549 – sequence: 3 givenname: Yuval surname: Greenzweig fullname: Greenzweig, Yuval organization: Intel Corporation, MS: SC9-68, Santa Clara, California 95054-1549 – sequence: 4 givenname: John surname: Notte fullname: Notte, John organization: Carl Zeiss SMT, 1 Corporation Way, Peabody, Massachusetts 01960 – sequence: 5 givenname: Shawn surname: McVey fullname: McVey, Shawn organization: Carl Zeiss SMT, 1 Corporation Way, Peabody, Massachusetts 01960 |
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Cites_doi | 10.1103/PhysRevB.55.5037 10.1134/1.1538730 10.1016/j.phpro.2008.07.089 |
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Keywords | Helium Ion Gallium Implant Damage Sub-surface damage Focused Ion Beam Helium Helium Ion Microscope Silicon dislocations FIB |
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References | Livengood, Grumski, Greenzweig, Liang, Jamison, Xie (c5) 2008; 1 Reutov, Sokhatskii (c6) 2003; 48 Paccagnella, Cester, Cellere (c3); 2004 Estreicher, Weber, Derecskei-Kovacs, Marynick (c7) 1997; 55 Reutov, V.; Sokhatskii, A. 2003; 48 Estreicher, D.; Weber, J.; Derecskei-Kovacs, A.; Marynick, D. 1997; 55 Livengood, R.; Grumski, M.; Greenzweig, Y.; Liang, T.; Jamison, R.; Xie, Q. 2008; 1 Paccagnella, A.; Cester, A.; Cellere, G.; 2004 (2023071607184975200_c6) 2003; 48 (2023071607184975200_c2) 2006 (2023071607184975200_c7) 1997; 55 (2023071607184975200_c1) 2006 (2023071607184975200_c3); 2004 (2023071607184975200_c4) 1984 (2023071607184975200_c5) 2008; 1 |
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