Dual patterning and sequential functionalization of block copolymers using photocrosslinkable random copolymer film

A novel method of dual patterning and sequential functionalization of block copolymers is proposed using a photocrosslinkable random copolymer film, poly(styrene-r-(tert-butyl acrylate)-r-(cinnamoyloxyethyl acrylate)). The tert-butyl esters of the block copolymer, polystyrene-block-poly(tert-butyl a...

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Published inNanotechnology Vol. 20; no. 28; pp. 285304 - 285304 (6)
Main Authors Ku, Se Jin, Kim, Su Min, Kim, Jin-Baek
Format Journal Article
LanguageEnglish
Published England IOP Publishing 15.07.2009
Subjects
Acrylates - chemistry
Nanoparticles - chemistry
Photochemistry - methods
Polymers - chemical synthesis
Polymers - chemistry
Polystyrenes - chemistry
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Summary:A novel method of dual patterning and sequential functionalization of block copolymers is proposed using a photocrosslinkable random copolymer film, poly(styrene-r-(tert-butyl acrylate)-r-(cinnamoyloxyethyl acrylate)). The tert-butyl esters of the block copolymer, polystyrene-block-poly(tert-butyl acrylate), coated on the patterned random copolymer film were sequentially deprotected to give carboxylic acids using an acid catalyst and heat treatment. The sequentially produced carboxylic acid patterns were used for the sequential patterning of gold nanoparticles as an example of potential applications.
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ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/20/28/285304