Development and Fabrication of TiO2 Tip Arrays for Gas Sensing
Titanium oxide thin films were deposited at room temperature by reactive magnetron sputtering in a mixture of oxygen and argon on oxidized silicon substrates. The optimal etching characteristics of TiO2 films by reactive ion etching (RIE) and RIE with inductively coupled plasma source (ICP) were inv...
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Published in | Journal of Electrical Engineering Vol. 62; no. 6; pp. 363 - 366 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Bratislava
Versita
01.11.2011
De Gruyter Poland |
Subjects | |
Online Access | Get full text |
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Summary: | Titanium oxide thin films were deposited at room temperature by reactive magnetron sputtering in a mixture of oxygen and argon on oxidized silicon substrates. The optimal etching characteristics of TiO2 films by reactive ion etching (RIE) and RIE with inductively coupled plasma source (ICP) were investigated. Patterning of TiO2 tip arrays by electron beam lithography and dry etching were developed. Different spot sizes 200 and 500 nm in diameter and with spacing 500 and 1000 nm were investigated with regards to the minimal size and the pyramidal shape. Experimental results have shown that the exposure dose optimization wa a significant parameter for controlling the tip size and its shape. We successfully fabricated the pyramidal TiO2 tip arrays over an 1 × 1 mm2 area. The TiO2 tip array can be expected to have an important application in gas microsensors. |
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Bibliography: | istex:0DBA3940F19C0AF1EA9A8043163A22F1599A36CA ArticleID:v10187-011-0058-3 v10187-011-0058-3.pdf ark:/67375/QT4-SDK9DPRZ-1 |
ISSN: | 1335-3632 1339-309X |
DOI: | 10.2478/v10187-011-0058-3 |