Deposition of Ti thin film using the magnetron sputtering method

This paper presents a modification to conventional magnetron sputtering systems. The introduction of a grid in front of the target increases the metal ion ratio. Using OES and observing both Ti neutrals and ions, it was confirmed that the relative ionization could be qualitatively extended with grid...

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Bibliographic Details
Published inThin solid films Vol. 435; no. 1; pp. 145 - 149
Main Authors Jung, Min J., Nam, Kyung H., Shaginyan, Leonid R., Han, Jeon G.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier B.V 01.07.2003
Elsevier Science
Subjects
Applied sciences
Cross-disciplinary physics: materials science; rheology
Deposition by sputtering
Exact sciences and technology
Grid
Magnetron sputtering
Materials science
Metals. Metallurgy
Methods of deposition of films and coatings; film growth and epitaxy
Optical emission spectroscopy (OES)
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Titanium
Titanium
Magnetron sputtering
Optical emission spectroscopy (OES)
Grid
Densification
Roughness
Operating mode
Surfaces
Experimental study
Thin films
Grids
Magnetrons
Cathode sputtering
Ionization
Transition elements
Physical vapor deposition
Fabrication structure relation
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Summary:This paper presents a modification to conventional magnetron sputtering systems. The introduction of a grid in front of the target increases the metal ion ratio. Using OES and observing both Ti neutrals and ions, it was confirmed that the relative ionization could be qualitatively extended with grid-attached magnetron sputtering compared with a conventional magnetron system. On the other hand, the relative ionization of Ar decreased. Our results also show that the Ti films deposited by conventional magnetron exhibit (100) preferred orientation as the bias voltage increased. On the other hand, in the case of the grid-attached magnetron, the Ti films exhibit highly preferred (002) orientation with increasing bias voltage. The experiments clearly demonstrated that a dense Ti film with a smooth, specular reflecting surface can be produced using the grid-attached magnetron with increased Ti ion flux compared to the conventional magnetron.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(03)00344-4