α-Alumina coatings on WC/Co substrates by physical vapor deposition
Physical vapor deposition coatings for cutting tools may be deposited by, e.g. reactive magnetron sputtering. Alumina growth in Ar/O 2 gas mixtures gives rise to problems due to insulating layers on targets, and hysteresis effects with respect to oxygen gas flow. In this paper is described a technol...
Saved in:
Published in | International journal of refractory metals & hard materials Vol. 27; no. 2; pp. 507 - 512 |
---|---|
Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.03.2009
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Physical vapor deposition coatings for cutting tools may be deposited by, e.g. reactive magnetron sputtering. Alumina growth in Ar/O
2 gas mixtures gives rise to problems due to insulating layers on targets, and hysteresis effects with respect to oxygen gas flow. In this paper is described a technology for the deposition of crystalline alumina: reactive high power impulse magnetron sputtering. Pure Al was used as target material, and the cemented carbide (WC/Co) substrates were kept at 500–650
°C. Hysteresis effects with respect to oxygen gas flow were alleviated, which enabled stable growth at a high deposition rate. The high power impulses were helpful in obtaining a crystalline oxide coating. X-ray diffraction and cross-section transmission electron microscopy showed that α-alumina films were formed. Technological testing of these PVD alumina coatings, with state-of-the-art AlTiN as benchmark, showed significantly improved crater wear resistance in steel turning. |
---|---|
Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0263-4368 2213-3917 |
DOI: | 10.1016/j.ijrmhm.2008.10.007 |