PHOTOINITIATION SYSTEM FOR HOLOGRAPHIC RECORDING MATERIAL

• Published in: Journal of Photopolymer Science and Technology Vol. 5; no. 3; pp. 493 - 498
• Main Authors: ZHANG, CUNLIN, YU, MEIWEN, YANG, YONGYUAN, LI, JUN, WANG, ERJIAN
• Format: Journal Article
• Language: English
• Published: Hiratsuka The Society of Photopolymer Science and Technology(SPST) 1992; Japan Science and Technology Agency

Some p-N, N- dimethylamine and diethylamine substituted benzal ketone derivatives (ABK) are used as a new class of sensitizer for laser light induced radical photopolymerization of N-vinyl carbazole (NVC) and methacrylic acid benzal ester (MABE) by combination with diphenyliodonium salt (DPIO). The...