PHOTOINITIATION SYSTEM FOR HOLOGRAPHIC RECORDING MATERIAL

Some p-N, N- dimethylamine and diethylamine substituted benzal ketone derivatives (ABK) are used as a new class of sensitizer for laser light induced radical photopolymerization of N-vinyl carbazole (NVC) and methacrylic acid benzal ester (MABE) by combination with diphenyliodonium salt (DPIO). The...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 5; no. 3; pp. 493 - 498
Main Authors ZHANG, CUNLIN, YU, MEIWEN, YANG, YONGYUAN, LI, JUN, WANG, ERJIAN
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 1992
Japan Science and Technology Agency
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Summary:Some p-N, N- dimethylamine and diethylamine substituted benzal ketone derivatives (ABK) are used as a new class of sensitizer for laser light induced radical photopolymerization of N-vinyl carbazole (NVC) and methacrylic acid benzal ester (MABE) by combination with diphenyliodonium salt (DPIO). The relative efficiency of various ABK for polymerization of NVC and MABE to record holograms is in the order DEBP>DABA>ABA. An argon ion laser (488nm) is used for exposure. Trichromatic filters were made with the material.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.5.493