New Design Concepts for the Fabrication of Nanometric Gap Structures: Electrochemical Oxidation of OTS Mono- and Bilayer Structures

A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self‐assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetic...

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Published inSmall (Weinheim an der Bergstrasse, Germany) Vol. 8; no. 6; pp. 852 - 857
Main Authors Druzhinina, Tamara S., Hoeppener, Stephanie, Schubert, Ulrich S.
Format Journal Article
LanguageEnglish
Published Weinheim WILEY-VCH Verlag 26.03.2012
WILEY‐VCH Verlag
Subjects
electrochemical oxidation lithography
gap structures
nanofabrication
OTS
self-assembled monolayers
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Summary:A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self‐assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n‐octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.
Bibliography:istex:6929791793D3009AD3E2984DBB55271356F04E93
ark:/67375/WNG-ZRDNJMCQ-B
ArticleID:SMLL201101842
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.201101842