In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source
In situ focus characterization is demonstrated by working at an extreme ultraviolet (XUV) free-electron laser source using ablation technique. Design of the instrument reported here allows reaching a few micrometres resolution along with keeping the ultrahigh vacuum conditions and ensures high-contr...
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Published in | Review of scientific instruments Vol. 84; no. 6; p. 065104 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
United States
01.06.2013
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Online Access | Get more information |
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Summary: | In situ focus characterization is demonstrated by working at an extreme ultraviolet (XUV) free-electron laser source using ablation technique. Design of the instrument reported here allows reaching a few micrometres resolution along with keeping the ultrahigh vacuum conditions and ensures high-contrast visibility of ablative imprints on optically transparent samples, e.g., PMMA. This enables on-line monitoring of the beam profile changes and thus makes possible in situ alignment of the XUV focusing optics. A good agreement between focal characterizations retrieved from in situ inspection of ablative imprints contours and from well-established accurate ex situ analysis with Nomarski microscope has been observed for a typical micro-focus experiment. |
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ISSN: | 1089-7623 |
DOI: | 10.1063/1.4807896 |