Selective Laser Doping From Boron Silicate Glass

Laser-assisted diffusion of dopants is a promising way to produce selective doping structures such as selective emitters or localised BSF with a reduced number of technological steps. This paper discusses laser-induced selective diffusion of boron from two types of borosilicate glasses (BSG) produce...

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Bibliographic Details
Published inEnergy procedia Vol. 27; pp. 455 - 459
Main Authors Poulain, G., Blanc, D., Focsa, A., Gibier, J., Fourmond, E., Bazer-Bachi, B., Semmache, B., Pellegrin, Y., Lemiti, M.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 2012
Subjects
BSF
BSG
doping
Laser
selective emitters
silicon solar cell
doping
BSF
silicon solar cell
Laser
BSG
selective emitters
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Summary:Laser-assisted diffusion of dopants is a promising way to produce selective doping structures such as selective emitters or localised BSF with a reduced number of technological steps. This paper discusses laser-induced selective diffusion of boron from two types of borosilicate glasses (BSG) produced either by low-pressure diffusion using a BCl3 gas source or deposited by PECVD from a trimethylborate (TMB) liquid source. Laser parameters were optimised for efficient heat-assisted diffusion of boron atoms with reduced damage to the silicon substrate. Sheet resistance variation of about 60 ohm/sq was measured.
ISSN:1876-6102
1876-6102
DOI:10.1016/j.egypro.2012.07.093