Effect of doping location on photoconductive spectrum of SiGe quantum dots

Comparative analysis of photoconductive (PC) spectra obtained from SiGe quantum dots grown on Si shows large dependence on the location of doping. The sample with doping in the silicon barrier has much larger response than the sample in which the doping was placed in the wetting layer, i.e. in the s...

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Published inPhysica status solidi. A, Applications and materials science Vol. 204; no. 2; pp. 477 - 482
Main Authors Schacham, S. E., Vardi, A., Le Thanh, V., Finkman, E.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Berlin WILEY-VCH Verlag 01.02.2007
WILEY‐VCH Verlag
Wiley-VCH
Wiley
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Summary:Comparative analysis of photoconductive (PC) spectra obtained from SiGe quantum dots grown on Si shows large dependence on the location of doping. The sample with doping in the silicon barrier has much larger response than the sample in which the doping was placed in the wetting layer, i.e. in the self assembled dots. This is due to the penetration of the wave‐function into the barrier in the first structure, as shown by the 1‐D simulation. Several peaks in the infrared were observed, ranging from 70 to 220 meV, associated with inter‐level transitions of holes in the valance band of the dot or the wetting layer. The overall spectra and the relative intensity of the various peaks change drastically with bias magnitude and polarity. The PC signals increase super‐linearly with bias, indicating that the carriers are released into the quasi‐continuum through tunneling. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Bibliography:ark:/67375/WNG-2MG1Q203-2
istex:91A91AD504C2516CEE33CAB5BBF8F4BF0FD9EA0A
ArticleID:PSSA200673204
Devora fund
ISSN:1862-6300
1862-6319
DOI:10.1002/pssa.200673204