Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect

Metal electrode structures for biosensors with a high spatial density and nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in...

Full description

Saved in:
Bibliographic Details
Published inNanotechnology Vol. 15; no. 1; pp. 223 - 226
Main Authors Whitlow, Harry J, Ng, May Ling, Auželyté, Vaida, Maximov, Ivan, Montelius, Lars, Kan, Jeroen A van, Bettiol, Andrew A, Watt, Frank
Format Journal Article
LanguageEnglish
Romanian
Published IOP Publishing 01.01.2004
Subjects
Engineering and Technology
Nano Technology
Nanoteknik
Teknik
Online AccessGet full text

Cover

More Information
Summary:Metal electrode structures for biosensors with a high spatial density and nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in ( nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/15/1/040