Formation of thin tungsten oxide layers: characterization and exposure to deuterium

Thin tungsten oxide layers with thicknesses up to 250 nm have been formed on W surfaces by thermal oxidation following a parabolic growth rate. The reflectance of the layers in the IR range 2.5-16 m has been measured showing a decrease with the layer thickness especially at low wavelengths. Raman mi...

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Published inPhysica scripta Vol. T167; no. 1; pp. 14036 - 14040
Main Authors Addab, Y, Martin, C, Pardanaud, C, Khayadjian, J, Achkasov, K, Kogut, D, Cartry, G, Giacometti, G, Cabié, M, Gardarein, J L, Roubin, P
Format Journal Article
LanguageEnglish
Published IOP Publishing 20.02.2016
Subjects
Deuterium
deuterium retention
Diffusion layers
Exposure
Formations
Oxidation
Physics
plasma irradiation
Raman microscopy
reflectance
thermal oxidation
Thickness
thin film
Thin films
tungsten oxide
Tungsten oxides
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Summary:Thin tungsten oxide layers with thicknesses up to 250 nm have been formed on W surfaces by thermal oxidation following a parabolic growth rate. The reflectance of the layers in the IR range 2.5-16 m has been measured showing a decrease with the layer thickness especially at low wavelengths. Raman microscopy and x-ray diffraction show a nanocrystalline WO3 monoclinic structure. Low energy deuterium plasma exposure (11 eV D+) has been performed inducing a phase transition, a change in the sample colour and the formation of tungsten bronze (DxWO3). Implantation modifies the whole layer suggesting a deep diffusion of deuterium inside the oxide. After exposure, a deuterium release due to the oxidation of DxWO3 under ambient conditions has been evidenced showing a reversible deuterium retention.
Bibliography:Royal Swedish Academy of Sciences
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ISSN:0031-8949
1402-4896
DOI:10.1088/0031-8949/T167/1/014036