Silicon Electrodeposition in Water-Soluble KF-KCl Molten Salt: Investigations on the Reduction of Si(IV) Ions

A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was inv...

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Published inJournal of the Electrochemical Society Vol. 162; no. 9; pp. D444 - D448
Main Authors Maeda, Kazuma, Yasuda, Kouji, Nohira, Toshiyuki, Hagiwara, Rika, Homma, Takayuki
Format Journal Article
LanguageEnglish
Published The Electrochemical Society 01.01.2015
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Summary:A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an EqEr (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10−5 cm2 s−1 at 923 K by chronoamperometry.
Bibliography:0441509JES
ISSN:0013-4651
1945-7111
DOI:10.1149/2.0441509jes