Transparent Conductive Gas-Permeation Barriers on Plastics by Atomic Layer Deposition

A mixed‐deposition atomic layer deposition process produces Hf:ZnO films with uniform dopant distribution and high electrical conductivity (resistivity = 4.5 × 10−4 W cm), optical transparency (>85% from 400–1800 nm), and moisture‐barrier property (water vapor transmission rate = 6.3 × 10−6 g m−2...

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Published inAdvanced materials (Weinheim) Vol. 25; no. 12; pp. 1750 - 1754
Main Authors Chou, Chun-Ting, Yu, Pei-Wei, Tseng, Ming-Hung, Hsu, Che-Chen, Shyue, Jing-Jong, Wang, Ching-Chiun, Tsai, Feng-Yu
Format Journal Article
LanguageEnglish
Published Weinheim WILEY-VCH Verlag 25.03.2013
WILEY‐VCH Verlag
Subjects
atomic layer deposition
Barriers
Deposition
Dopants
Electrical conductivity
Electrical resistivity
encapsulation
flexible electronics
moisture barriers
Optical properties
Polymers
Resistivity
transparent conducting oxides
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Summary:A mixed‐deposition atomic layer deposition process produces Hf:ZnO films with uniform dopant distribution and high electrical conductivity (resistivity = 4.5 × 10−4 W cm), optical transparency (>85% from 400–1800 nm), and moisture‐barrier property (water vapor transmission rate = 6.3 × 10−6 g m−2 day−1).
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ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201204358