Formation of Single Tiers of Bridging Silicon Nanowires for Transistor Applications Using Vapor-Liquid-Solid Growth from Short Silicon-on-Insulator Sidewalls
Single tiers of silicon nanowires that bridge the gap between the short sidewalls of silicon‐on‐insulator (SOI) source/drain pads are formed. The formation of a single tier of bridging nanowires is enabled by the attachment of a single tier of Au catalyst nanoparticles to short SOI sidewalls and the...
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Published in | Small (Weinheim an der Bergstrasse, Germany) Vol. 5; no. 21; pp. 2440 - 2444 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Weinheim
WILEY-VCH Verlag
02.11.2009
WILEY‐VCH Verlag |
Subjects | |
Online Access | Get full text |
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Summary: | Single tiers of silicon nanowires that bridge the gap between the short sidewalls of silicon‐on‐insulator (SOI) source/drain pads are formed. The formation of a single tier of bridging nanowires is enabled by the attachment of a single tier of Au catalyst nanoparticles to short SOI sidewalls and the subsequent growth of epitaxial nanowires via the vapor–liquid–solid (VLS) process. The growth of unobstructed nanowire material occurs due to the attachment of catalyst nanoparticles on silicon surfaces and the removal of catalyst nanoparticles from the SOI‐buried oxide (BOX). Three‐terminal current–voltage measurements of the structure using the substrate as a planar backgate after VLS nanowire growth reveal transistor behaviour characteristics.
Single tiers of silicon nanowires that bridge the gap between the short sidewalls of silicon‐on‐insulator (SOI) source/drain pads are formed (see image). The formation of a single tier of bridging nanowires is enabled by the attachment of a single tier of Au catalyst nanoparticles to short SOI sidewalls and the subsequent growth of epitaxial nanowires via the vaporliquidsolid process. |
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Bibliography: | ArticleID:SMLL200900855 ark:/67375/WNG-RF1QK6BN-R istex:6E6ABB03140079EB36303227305394212C9EEF61 ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1613-6810 1613-6829 1613-6829 |
DOI: | 10.1002/smll.200900855 |