Rapid fabrication of nano-structured quartz stamps

• Published in: Nanotechnology Vol. 24; no. 5; p. 055304
• Main Authors: Chuo, Yindar, Landrock, Clint, Omrane, Badr, Hohertz, Donna, Grayli, Sasan V, Kavanagh, Karen, Kaminska, Bozena
• Format: Journal Article
• Language: English
• Published: Bristol IOP Publishing 08.02.2013; Institute of Physics
• Subjects: Arrays; Cross-disciplinary physics: materials science; rheology; Electron beam lithography; Etching; Exact sciences and technology; Ion beams; Materials science; Methods of nanofabrication; Nanocomposites; Nanocrystalline materials; Nanomaterials; Nanoscale materials and structures: fabrication and characterization; Nanoscale pattern formation; Nanostructure; Patterning; Physics; Electron beam lithography; Etching; Pillared structure; Nanostructures; Focused ion beam technology; Surface structure; Thin films; Direct method; Time dependence; Metallic thin films; Nanopatterning; Ion beam lithography; Optical transmission; Absorption spectra; Polymers; Patterning; DNA replication; Metal deposition; Embossing; Quartz; Soft lithography; Lift off; Anisotropy; Silicon oxides; Chromium; Maskless lithography; Surface plasmon resonance; Arrays
• ISSN: 0957-4484; 1361-6528
• DOI: 10.1088/0957-4484/24/5/055304

Replication of surface nano-structures from a master stamp allows large-area volume production that is otherwise cost prohibitive through conventional direct-write methods, such as electron beam lithography and focused ion beam milling. However, the creation of a master stamp containing sophisticated patterns still requires significant time on such direct-write tools. We demonstrate a method for reducing this tool time by patterning smaller nano-structures, and then enlarging them to the desired size through isotropic etching. We can create circular structures of any arrangement and size, down to the patterning limits of the direct-write tools. Subsequent metal mask deposition, lift-off, and anisotropic etching transforms the circular patterns to out-of-plane pillar structures for the final stamp. A 1 cm2 area filled with a pattern of 200 nm diameter nano-holes spaced 520 nm apart, requires only 21 h to complete using our process, compared to 75 h using conventional fabrication. We demonstrate the utility and practicality of the quartz stamps through polymer embossing and replication. Embossed polymer nano-hole arrays are coated with a Cr/Au (5/100 nm) film to create surface plasmon resonance structures. Extraordinary optical transmission spectra from the metallized arrays show the expected spectral features when compared to focused ion beam milled structures.