Effects of substrate temperature on electrical and optical properties ITO films deposited by r.f. magnetron sputtering

• Published in: Journal of electroceramics Vol. 23; no. 2-4; pp. 554 - 558
• Main Author: Lee, Jae-Hyeong
• Format: Journal Article
• Language: English
• Published: Boston Springer US 01.10.2009; Springer Nature B.V
• Subjects: Ceramics; Characterization and Evaluation of Materials; Chemistry and Materials Science; Composites; Crystallography and Scattering Methods; Deposition; Diffraction; Electrochemistry; Glass; Indium tin oxide; Indium tin oxides; Magnetron sputtering; Materials Science; Natural Materials; Optical and Electronic Materials; Optical properties; Preferred orientation; Reflectance; Resistivity; ITO film; Powder target; Substrate temperature; Sputtering
• ISSN: 1385-3449; 1573-8663
• DOI: 10.1007/s10832-008-9539-6

Indium tin oxide (ITO) films have been prepared by r.f. magnetron sputtering using powder target. X-ray diffraction analysis indicates that the deposited films were polycrystalline and retained a cubic bixbite structure. The ITO films deposited at low substrate temperature ( T s ) exhibit a (411) preferred orientation but the films deposited at high T s prefer a (111) orientation. The substrate temperature was found to significantly affect the electrical properties. As the T s was increased, the conductivity of ITO films was improved due to thermally induced crystallization. The lowest resistivity (8.7 × 10 −4  Ω-cm) was obtained from ITO films deposited at 450 °C. However, optical properties of the films were somewhat deteriorated. The infrared (IR) reflectance of the film increases with increasing the substrate temperature.