An Analytical Model for the Threshold Voltage Shift Caused by Two-Dimensional Quantum Confinement in Undoped Multiple-Gate MOSFETs

An analytical model describing the effects of 2-D quantum-mechanical carrier confinement on the threshold voltage V th of multiple-gate MOSFETs with rectangular cross section is developed. The model is verified by a comparison with self-consistent solutions of 1-D and 2-D Schroumldinger and Poisson...

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Bibliographic Details
Published inIEEE transactions on electron devices Vol. 54; no. 9; pp. 2562 - 2565
Main Authors Granzner, R., Schwierz, F., Polyakov, V.M.
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.09.2007
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:An analytical model describing the effects of 2-D quantum-mechanical carrier confinement on the threshold voltage V th of multiple-gate MOSFETs with rectangular cross section is developed. The model is verified by a comparison with self-consistent solutions of 1-D and 2-D Schroumldinger and Poisson equations. It is shown that: 1) the model results asymptotically approach the case of 1-D confinement in single-gate silicon-on-insulator or double-gate MOSFETs if one body dimension becomes larger than 20 nm and 2) the effect of 2-D confinement is remarkably stronger than a simple combination of two 1-D quantization effects.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2007.902167