An Analytical Model for the Threshold Voltage Shift Caused by Two-Dimensional Quantum Confinement in Undoped Multiple-Gate MOSFETs
An analytical model describing the effects of 2-D quantum-mechanical carrier confinement on the threshold voltage V th of multiple-gate MOSFETs with rectangular cross section is developed. The model is verified by a comparison with self-consistent solutions of 1-D and 2-D Schroumldinger and Poisson...
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Published in | IEEE transactions on electron devices Vol. 54; no. 9; pp. 2562 - 2565 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
New York, NY
IEEE
01.09.2007
Institute of Electrical and Electronics Engineers The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | An analytical model describing the effects of 2-D quantum-mechanical carrier confinement on the threshold voltage V th of multiple-gate MOSFETs with rectangular cross section is developed. The model is verified by a comparison with self-consistent solutions of 1-D and 2-D Schroumldinger and Poisson equations. It is shown that: 1) the model results asymptotically approach the case of 1-D confinement in single-gate silicon-on-insulator or double-gate MOSFETs if one body dimension becomes larger than 20 nm and 2) the effect of 2-D confinement is remarkably stronger than a simple combination of two 1-D quantization effects. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2007.902167 |