Synthesis of Antimony-Based Nanowires Using the Simple Vapor Deposition Method

III–V nanowires have attracted plenty of attention because of their potential outstanding performance in a wide range of applications. However, compared to other III–V nanowires, the synthesis of high quality Sb‐based nanowires is less developed, which obstructs the progress towards further applicat...

Full description

Saved in:
Bibliographic Details
Published inChemphyschem Vol. 13; no. 10; pp. 2585 - 2588
Main Authors Zi, Yunlong, Zhao, Yanjie, Candebat, Drew, Appenzeller, Joerg, Yang, Chen
Format Journal Article
LanguageEnglish
Published Weinheim WILEY-VCH Verlag 16.07.2012
WILEY‐VCH Verlag
Wiley
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:III–V nanowires have attracted plenty of attention because of their potential outstanding performance in a wide range of applications. However, compared to other III–V nanowires, the synthesis of high quality Sb‐based nanowires is less developed, which obstructs the progress towards further applications. In this study we report high quality GaSb and InSb nanowires synthesized by a simple vapor deposition method. Epitaxial growth of nanowires on growth substrates is demonstrated. Te doped GaSb nanowires are achieved through in situ doping during the vapor deposition process. Electrical measurements of nanowire field‐effect transistors show high performance of the synthesized InSb nanowires. GaSb and InSb nanowires: Vapor deposition is used for the synthesis of high quality GaSb and InSb nanowires. Epitaxial growth and doping capability are also demonstrated. The high on‐currents of InSb nanowire field‐effect transistors qualify nanowires synthesized for electronic applications.
Bibliography:Army Research Office - No. ARO W911NF-10-1-0190
ark:/67375/WNG-5VFTP6MF-S
istex:B7EEBEE98296BD0F0867B861B1D593D2B684369F
NSF - No. DMR 084752
ArticleID:CPHC201101042
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1439-4235
1439-7641
DOI:10.1002/cphc.201101042