Compact high-repetition-rate source of coherent 100 eV radiation
Coherently enhancing laser pulses in a passive cavity provides ideal conditions for high-order harmonic generation in a gas, with repetition rates around 100 MHz (refs 1 , 2 , 3 ). Recently, extreme-ultraviolet radiation with photon energies of up to 30 eV was obtained, which is sufficiently bright...
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Published in | Nature photonics Vol. 7; no. 8; pp. 608 - 612 |
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Main Authors | , , , , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
London
Nature Publishing Group UK
01.08.2013
Nature Publishing Group |
Subjects | |
Online Access | Get full text |
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Summary: | Coherently enhancing laser pulses in a passive cavity provides ideal conditions for high-order harmonic generation in a gas, with repetition rates around 100 MHz (refs
1
,
2
,
3
). Recently, extreme-ultraviolet radiation with photon energies of up to 30 eV was obtained, which is sufficiently bright for direct frequency-comb spectroscopy at 20 eV (ref.
4
). Here, we identify a route to scaling these radiation sources to higher photon energies. We demonstrate that the ionization-limited attainable intracavity peak intensity increases with decreasing pulse duration. By enhancing nonlinearly compressed pulses of an Yb-based laser and coupling out the harmonics through a pierced cavity mirror, we generate spatially coherent 108 eV (11.45 nm) radiation at 78 MHz. Exploiting the full potential of the demonstrated techniques will afford high-photon-flux ultrashort-pulsed extreme-ultraviolet sources for a number of applications in science and technology, including photoelectron spectroscopy, coincidence spectroscopy with femtosecond to attosecond resolution
5
,
6
and characterization of components and materials for nanolithography
7
.
Spatially coherent 11.45 nm radiation is produced by outcoupling the harmonics of cavity-enhanced nonlinearly compressed pulses from a Yb-based laser through a pierced cavity mirror. This technique may lead to high-photon-flux ultrashort-pulse extreme-ultraviolet sources for use in a wide range of applications. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1749-4885 1749-4893 |
DOI: | 10.1038/nphoton.2013.156 |